Publication Date
1997
Degree Type
Thesis
Degree Name
Master of Science (MS)
Department
Materials Engineering
Recommended Citation
Chung, Anthony Hyunwoo, "Reactive ion etching of SiO₂ using CHF₃/CO₂ gas mixture" (1997). Master's Theses. 1565.
DOI: https://doi.org/10.31979/etd.srn6-ayg2
https://scholarworks.sjsu.edu/etd_theses/1565
COinS
