Publication Date
2006
Degree Type
Thesis
Degree Name
Master of Science (MS)
Department
Chemical and Materials Engineering
Recommended Citation
Gholizadeh, Nasim, "Characterization of 157 nm photoresist materials for advanced lithographic processess" (2006). Master's Theses. 2882.
DOI: https://doi.org/10.31979/etd.jeg2-9dx6
https://scholarworks.sjsu.edu/etd_theses/2882
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