Publication Date
1993
Degree Type
Thesis
Degree Name
Master of Science (MS)
Department
Materials Engineering
Recommended Citation
Raghuram, Usha, "Reactive ion etching of Si/SiO2 by CHF3/CH4/O2 gas mixture" (1993). Master's Theses. 575.
DOI: https://doi.org/10.31979/etd.vg93-34qj
https://scholarworks.sjsu.edu/etd_theses/575
COinS
